Chemical vapor deposition reactions

Pure elements

  • Transition metal film:  Ti, Mo, W, Nb, Re, Ta, Zr, Hf
  • Non-metal film: B, C, Si, Ge

Binary compounds

  • Carbides: B4C, SiC, TiC, WC, HfC, NbC, TaC, VC, ZrC
  • Silicides: MoSi2, WSi2, TiSi2, V3Si, Nb3Si
  • Nitrides: BN, AlN, GaN, TiN, VN, ZrN, HfN, TaN, NbN, Si3N4, Ge3N4, FexN
  • Oxides: Al2O3, Ga2O3, SiO2, HfO2, Ta2O5, Nb2O5, SnO2, TiO2, ZrO2
  • Borides:  TiB2, ZrB2, HfB2
  • Chalcogenides:  MoS2, WS2, MoSe2, WSe2