Custom CVD reactors

Chemical vapor deposition equipment design and process engineering for custom applications

  • Thin film deposition
  • Coatings
  • Bulk layer deposition for freestanding shapes  (tube, crucible, etc) manufacturing

TRINITRI-Technology has extensive experience in the design, manufacture and operation of Halide/Hydride vapor phase epitaxy (HVPE) reactors and chemical vapor deposition (CVD) furnaces for wide range of materials:

  • Epitaxial deposition of  GaN and AlN thin films and bulk GaN layers with thickness up to 10 mm by Halide Vapor Phase Epitaxy (HVPE) process.
  • Transition metal film: Mo, W, Nb, Re, Ta, Zr, Hf
  • Non-metal film: B, C, Si, Ge
  • Carbides: B4C, SiC, TiC, WC, HfC, NbC, TaC, VC, ZrC
  • Silicides: MoSi2, WSi2, TiSi2, V3Si, Nb3Si
  • Nitrides: BN, AlN, GaN, TiN, VN, ZrN, HfN, TaN, NbN, Si3N4, Ge3N4, FexN
  • Oxides: Al2O3, Ga2O3, SiO2, HfO2, Ta2O5, Nb2O5, SnO2, TiO2, ZrO2
  • Borides:  TiB2, ZrB2, HfB2
  • Chalcogenides:  MoS2, WS2

 

To place an order, please contact info@trinitri.ru